Invention Application
- Patent Title: SUBSTRATE TREATING APPARATUS AND METHOD FOR CLEANING THE SAME
- Patent Title (中): 基板处理装置及其清洗方法
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Application No.: US14707151Application Date: 2015-05-08
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Publication No.: US20150352608A1Publication Date: 2015-12-10
- Inventor: Tea-Geon KIM
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Priority: KR10-2014-0070255 20140610
- Main IPC: B08B9/46
- IPC: B08B9/46 ; B08B9/08 ; B08B5/02
Abstract:
A substrate treating apparatus includes a chamber defining an inside space, a supply passage connected to the inside space to supply a cleaning gas for cleaning, a discharge passage connected to the inside space to discharge the cleaning gas from the inside space, and an exhaust member connected to the discharge passage for forcedly exhausting the cleaning gas from the inside space through the discharge passage.
Information query
IPC分类:
