Invention Application
US20150364549A1 SEMICONDUCTOR DEVICE WITH SILICON CARBIDE EMBEDDED DUMMY PATTERN 审中-公开
半导体器件与硅碳化物嵌入式模式

SEMICONDUCTOR DEVICE WITH SILICON CARBIDE EMBEDDED DUMMY PATTERN
Abstract:
A semiconductor device with dummy patterns for alleviating micro-loading effect includes a semiconductor substrate having thereon a middle annular region between an inner region and an outer region; a SiC device on the semiconductor substrate within the inner region; and a plurality of dummy patterns provided on the semiconductor substrate within the middle annular region. At least one of the dummy patterns contains SiC.
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