发明申请
- 专利标题: METHOD FOR FORMING ORGANIC SEMICONDUCTOR FILM
- 专利标题(中): 形成有机半导体膜的方法
-
申请号: US14835317申请日: 2015-08-25
-
公开(公告)号: US20150364686A1公开(公告)日: 2015-12-17
- 发明人: Yoshiki MAEHARA , Yoshihisa USAMI
- 申请人: FUJIFILM CORPORATION
- 申请人地址: JP Tokyo
- 专利权人: FUJIFILM CORPORATION
- 当前专利权人: FUJIFILM CORPORATION
- 当前专利权人地址: JP Tokyo
- 优先权: JP2013-050638 20130313
- 主分类号: H01L51/00
- IPC分类号: H01L51/00
摘要:
A method for forming an organic semiconductor film includes: forming a solution film by applying a solution containing an organic semiconductor material and a solvent to at least a part of a substrate; and drying the solution film by irradiating at least a part of the solution film with electromagnetic waves with a wavelength of at least 8 μm and an energy density of from 0.1 to 10 J/cm2 on the surface of the solution film before the solution film dries. An organic semiconductor film having good crystallinity can be formed by the method.
公开/授权文献
- US09680099B2 Method for forming organic semiconductor film 公开/授权日:2017-06-13