发明申请
- 专利标题： PLASMA SOURCE
- 专利标题（中）： 等离子体源
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申请号： US14765817申请日： 2013-02-06
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公开(公告)号： US20160005575A1公开(公告)日： 2016-01-07
- 发明人: Florin Daniel Duminica , Vincent LeClercq , Eric Silberberg , Alain Daniel
- 申请人： ARCELORMITTAL INVESTIGACIÓN Y DESARROLLO SL
- 申请人地址： ES Sestao
- 专利权人： ARCELORMITTAL INVESTIGACIÓN Y DESARROLLO SL
- 当前专利权人： ARCELORMITTAL INVESTIGACIÓN Y DESARROLLO SL
- 当前专利权人地址： ES Sestao
- 国际申请： PCT/EP2013/052340 WO 20130206
- 主分类号： H01J37/32
- IPC分类号： H01J37/32
摘要：
The invention relates to a plasma source (1) for depositing a coating onto a substrate (9), which is connectable to a power source (P) and includes: an electrode (2); a magnetic assembly (4) located circumferentially relative to said electrode and including a set of magnets mutually connected by a magnetic bracket (46) including a first and second central magnet (43, 44) and at least one head magnet (45); and an electrically insulating enclosure (5) arranged such as to surround the electrode and the magnets.
公开/授权文献
- US09805918B2 Plasma source 公开/授权日：2017-10-31
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