Invention Application
- Patent Title: MASK FOR PHOTOLITHOGRAPHY, METHOD OF MANUFACTURING THE SAME AND METHOD OF MANUFACTURING SUBSTRATE USING THE SAME
- Patent Title (中): 用于光刻机的掩模，其制造方法和使用其制造基板的方法
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Application No.: US14752415Application Date: 2015-06-26
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Publication No.: US20160033857A1Publication Date: 2016-02-04
- Inventor: Yong Son , Min Kang , Bong-Yeon Kim , Hyun-Joo Lee , Hyang-Shik Kong , Jin-Ho Ju , Kyoung-Sik Kim , Seung-Hwa Baek
- Applicant: SAMSUNG DISPLAY CO., LTD. , INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY
- Priority: KR10-2014-0099687 20140804
- Main IPC: G03F1/26
- IPC: G03F1/26 ; G03F7/32 ; G03F7/20
Abstract:
A mask for photolithography includes: a transparent substrate; a phase shift pattern on the transparent substrate and configured to change a phase of light; a dielectric layer on the transparent substrate; and a negative refractive-index meta material layer on the dielectric layer.
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