发明申请
US20160053129A1 Sulfonamide-Containing Topcoat and Photoresist Additive Compositions and Methods of Use
有权
含磺酰胺的面漆和光致抗蚀剂添加剂组合物和使用方法
- 专利标题： Sulfonamide-Containing Topcoat and Photoresist Additive Compositions and Methods of Use
- 专利标题（中）： 含磺酰胺的面漆和光致抗蚀剂添加剂组合物和使用方法
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申请号： US14933851申请日： 2015-11-05
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公开(公告)号： US20160053129A1公开(公告)日： 2016-02-25
- 发明人: Daniel Paul Sanders , Masaki Fujiwara , Yoshiharu Terui
- 申请人： International Business Machines Corporation , Central Glass Co., Ltd.
- 申请人地址： JP Ubeshi US NY Armonk
- 专利权人： CENTRAL GLASS CO., LTD.,INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人： CENTRAL GLASS CO., LTD.,INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址： JP Ubeshi US NY Armonk
- 主分类号： C09D133/16
- IPC分类号： C09D133/16
摘要：
Provided are sulfonamide-containing compositions, topcoat polymers, and additive polymers for use in lithographic processes that have improved static receding water contact angles over those known in the art. The sulfonamide-containing topcoat polymers and additive polymers of the present invention include sulfonamide-substituted repeat units with branched linking group as shown in Formula (I):
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