Invention Application
- Patent Title: SELF-ALIGNED BACK END OF LINE CUT
- Patent Title (中): 自动对齐的线切割后端
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Application No.: US14463803Application Date: 2014-08-20
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Publication No.: US20160056104A1Publication Date: 2016-02-25
- Inventor: Guillaume Bouche , Andy Chih-Hung Wei , Mark A. Zaleski
- Applicant: GLOBALFOUNDRIES Inc.
- Main IPC: H01L23/528
- IPC: H01L23/528 ; H01L21/02 ; H01L21/768 ; H01L21/3213 ; H01L23/522 ; H01L23/532
Abstract:
Embodiments of the present invention provide a method for self-aligned metal cuts in a back end of line structure. Sacrificial Mx+1 lines are formed above metal Mx lines. Spacers are formed on each Mx+1 sacrificial line. The gap between the spacers is used to determine the location and thickness of cuts to the Mx metal lines. This ensures that the Mx metal line cuts do not encroach on vias that interconnect the Mx and Mx+1 levels. It also allows for reduced limits in terms of via enclosure rules, which enables increased circuit density.
Public/Granted literature
- US09508642B2 Self-aligned back end of line cut Public/Granted day:2016-11-29
Information query
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