Invention Application
US20160056153A1 SEMICONDUCTOR DEVICES AND METHODS OF FORMING THE SAME 有权
半导体器件及其形成方法

SEMICONDUCTOR DEVICES AND METHODS OF FORMING THE SAME
Abstract:
A semiconductor device includes first and second gate structures extending in a first direction and spaced apart from each other in a second direction intersecting the first direction, a third gate structure extending in the first direction and provided between the first and second gate structures, a first contact connected to the first gate structure and having a first width in the second direction, a second contact connected to the second gate structure and having a second width in the second direction, and a third contact connected to the third gate structure and having a third width in the second direction. The first, second, and third contacts may be aligned with each other in the second direction to constitute one row. The first and second widths may be greater than the third width.
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