发明申请
- 专利标题: LOW TEMPERATURE POLY-SILICON THIN FILM PREPARATION APPARATUS AND METHOD FOR PREPARING THE SAME
- 专利标题(中): 低温多硅薄膜制备装置及其制备方法
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申请号: US14408337申请日: 2014-09-23
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公开(公告)号: US20160060167A1公开(公告)日: 2016-03-03
- 发明人: Jia LI
- 申请人: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO. LTD.
- 专利权人: Shenzhen China Star Optoelectronics Technology Co. Ltd.
- 当前专利权人: Shenzhen China Star Optoelectronics Technology Co. Ltd.
- 优先权: CN201410444447.8 20140903
- 国际申请: PCT/CN2014/087179 WO 20140923
- 主分类号: C03C25/62
- IPC分类号: C03C25/62 ; C03C25/68 ; C03B25/08 ; C03C17/245
摘要:
A low temperature poly-silicon thin film preparation apparatus and a method for preparing the same are disclosed, the preparation apparatus comprises a substrate cleaning tank and an ozone generating device connected thereto, such that not only can blow off residual liquid on a surface of a glass substrate, but can also allow the glass substrate to directly contact the ozone, such that a silicon film on the surface of the glass substrate is more smooth and less impure, and an oxide film formed on the surface is more uniform since it contacts with the ozone at the first time after being cleaned by hydrofluoric acid, therefore the crystalline effect is more excellent.
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