Invention Application
- Patent Title: Lamp Heater For Atomic Layer Deposition
- Patent Title (中): 原子层沉积灯加热器
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Application No.: US14785009Application Date: 2014-04-10
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Publication No.: US20160068958A1Publication Date: 2016-03-10
- Inventor: Umesh M. Kelkar , Kallol Bera , Karthik Ramanathan , Garry K Kwong , Joseph Yudovsky
- Applicant: Umesh M KELKAR , Kallol BERA , Karthik RAMANATHAN , Garry K KWONG , Joseph YUDOVSKY , Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- International Application: PCT/US14/33604 WO 20140410
- Main IPC: C23C16/46
- IPC: C23C16/46 ; C23C16/458 ; C23C16/455
Abstract:
Apparatus and methods for processing a plurality of semiconductor wafers on a susceptor assembly so that the temperature across the susceptor assembly is uniform are described. A plurality of linear lamps are positioned and controlled in zones to provide uniform heating.
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