Invention Application
US20160084758A1 METROLOGY IMAGING TARGETS HAVING REFLECTION-SYMMETRIC PAIRS OF REFLECTION-ASYMMETRIC STRUCTURES
审中-公开
具有反射 - 非对称结构的反射对称对称的计量成像目标
- Patent Title: METROLOGY IMAGING TARGETS HAVING REFLECTION-SYMMETRIC PAIRS OF REFLECTION-ASYMMETRIC STRUCTURES
- Patent Title (中): 具有反射 - 非对称结构的反射对称对称的计量成像目标
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Application No.: US14928514Application Date: 2015-10-30
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Publication No.: US20160084758A1Publication Date: 2016-03-24
- Inventor: Amnon Manassen , Yuri Paskover , Barry Loevsky , Daria Negri
- Applicant: KLA-Tencor Corporation
- Main IPC: G01N21/47
- IPC: G01N21/47 ; G06F17/50

Abstract:
Metrology targets, design files, and design and production methods thereof are provided. Metrology targets comprising at least one reflection-symmetric pair of reflection-asymmetric structures are disclosed. The structures may or may not be periodic, may comprise a plurality of unevenly-spaced target elements, which may or may not be segmented. The asymmetry may be with respect to target element segmentation or structural dimensions. Also, target design files and metrology measurements of the various metrology targets are disclosed.
Public/Granted literature
- US10190979B2 Metrology imaging targets having reflection-symmetric pairs of reflection-asymmetric structures Public/Granted day:2019-01-29
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