Invention Application
US20160085150A1 PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING CIRCUIT PATTERN USING THE SAME
审中-公开
光电组合物及使用其制造电路图案的方法
- Patent Title: PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING CIRCUIT PATTERN USING THE SAME
- Patent Title (中): 光电组合物及使用其制造电路图案的方法
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Application No.: US14627690Application Date: 2015-02-20
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Publication No.: US20160085150A1Publication Date: 2016-03-24
- Inventor: Jeong Won KIM , Kwang Woo PARK , Seung Bo SHIM , Jun Hyuk WOO , Jin Ho JU
- Applicant: Samsung Display Co. Ltd.
- Priority: KR10-2014-0125130 20140919
- Main IPC: G03F7/038
- IPC: G03F7/038 ; H05K3/06
Abstract:
A photoresist composition includes an alkali soluble resin, a photosensitive compound, a first solvent having a boiling point of less than 200° C., and a second solvent having a boiling point of equal to or greater than 200° C.
Information query
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