Invention Application
- Patent Title: ANTIREFLECTION FILM, MANUFACTURING METHOD OF ANTIREFLECTION FILM, KIT INCLUDING ANTIREFLECTION FILM AND CLEANING CLOTH
- Patent Title (中): 抗反射膜,抗反射膜制造方法,包括抗反射膜和清洁布
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Application No.: US14869252Application Date: 2015-09-29
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Publication No.: US20160091635A1Publication Date: 2016-03-31
- Inventor: Shuntaro IBUKI , Yutaka ADEGAWA
- Applicant: FUJIFILM CORPORATION
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM CORPORATION
- Current Assignee: FUJIFILM CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP2014-200054 20140930
- Main IPC: G02B1/118
- IPC: G02B1/118 ; B08B1/00 ; G02B1/14

Abstract:
There is provided an antireflection film including an unevenness structure having an average cycle shorter than a visible light wavelength on a transparent substrate film, wherein in the unevenness structure, an average aspect ratio of an average height of convex portions or an average depth of concave portions to an average cycle is from 1.0 to 3.0, a water contact angle to an unevenness structure surface is 100° or more, and a specular reflectance is 2.0% or less.
Information query