Invention Application
US20160096930A1 METHOD FOR MANUFACTURING POLYSILSESQUIOXANE BY USING CARBON DIOXIDE SOLVENT AND POLYSILSESQUIOXANE MANUFACTURED USING THE SAME 有权
使用二氧化碳溶剂制造多晶硅烷的方法和使用其制造的多晶硅烷

  • Patent Title: METHOD FOR MANUFACTURING POLYSILSESQUIOXANE BY USING CARBON DIOXIDE SOLVENT AND POLYSILSESQUIOXANE MANUFACTURED USING THE SAME
  • Patent Title (中): 使用二氧化碳溶剂制造多晶硅烷的方法和使用其制造的多晶硅烷
  • Application No.: US14350564
    Application Date: 2013-04-18
  • Publication No.: US20160096930A1
    Publication Date: 2016-04-07
  • Inventor: In PARKHa Soo HWANG
  • Applicant: KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY
  • Priority: KR10-2012-0145033 20121213
  • International Application: PCT/KR2013/003280 WO 20130418
  • Main IPC: C08G77/08
  • IPC: C08G77/08 C08G77/04 C08G77/24 C08G77/28 C08G77/26
METHOD FOR MANUFACTURING POLYSILSESQUIOXANE BY USING CARBON DIOXIDE SOLVENT AND POLYSILSESQUIOXANE MANUFACTURED USING THE SAME
Abstract:
Disclosed is a method for manufacturing the polysilsesquioxane (PSSQ) within the carbon dioxide solvent through the control of the pressure and temperature within a reactor by the state changes, e.g., a liquid state or supercritical state, of carbon dioxide as a solvent which is environmentally friendly and pollution-free, that is to say, by making use of the fact that the solubility of reactant and product is changed according to the pressure and temperature in manufacturing the polysilsesquioxane (PSSQ).
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