Invention Application
- Patent Title: METHOD FOR MANUFACTURING POLYSILSESQUIOXANE BY USING CARBON DIOXIDE SOLVENT AND POLYSILSESQUIOXANE MANUFACTURED USING THE SAME
- Patent Title (中): 使用二氧化碳溶剂制造多晶硅烷的方法和使用其制造的多晶硅烷
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Application No.: US14350564Application Date: 2013-04-18
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Publication No.: US20160096930A1Publication Date: 2016-04-07
- Inventor: In PARK , Ha Soo HWANG
- Applicant: KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY
- Priority: KR10-2012-0145033 20121213
- International Application: PCT/KR2013/003280 WO 20130418
- Main IPC: C08G77/08
- IPC: C08G77/08 ; C08G77/04 ; C08G77/24 ; C08G77/28 ; C08G77/26

Abstract:
Disclosed is a method for manufacturing the polysilsesquioxane (PSSQ) within the carbon dioxide solvent through the control of the pressure and temperature within a reactor by the state changes, e.g., a liquid state or supercritical state, of carbon dioxide as a solvent which is environmentally friendly and pollution-free, that is to say, by making use of the fact that the solubility of reactant and product is changed according to the pressure and temperature in manufacturing the polysilsesquioxane (PSSQ).
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