Invention Application
US20160097972A1 PHASE SHIFT MASK AND METHOD OF MANUFACTURING DISPLAY APPARATUS USING THE SAME
有权
相位移屏蔽和使用该显示装置制造显示装置的方法
- Patent Title: PHASE SHIFT MASK AND METHOD OF MANUFACTURING DISPLAY APPARATUS USING THE SAME
- Patent Title (中): 相位移屏蔽和使用该显示装置制造显示装置的方法
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Application No.: US14794079Application Date: 2015-07-08
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Publication No.: US20160097972A1Publication Date: 2016-04-07
- Inventor: Bongyeon KIM , Min KANG , Yong SON , Hyunjoo LEE , Myounggeun CHA , Jinho JU
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Priority: KR10-2014-0134486 20141006
- Main IPC: G03F1/26
- IPC: G03F1/26 ; G03F7/20

Abstract:
Provided is a method of manufacturing a display apparatus, the method including forming an amorphous silicon layer on a substrate; changing amorphous silicon in the amorphous silicon layer into crystalline silicon by irradiating the amorphous silicon with a laser beam emitted through a phase shift mask; and forming a display device, the phase shift mask including a base substrate; a barrier layer on the base substrate and including a plurality of transmissive portions which are spaced apart from each other in a first direction; and phase shift portions which alternately fill the plurality of transmissive portions in the first direction.
Public/Granted literature
- US09417516B2 Phase shift mask and method of manufacturing display apparatus using the same Public/Granted day:2016-08-16
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