Invention Application
US20160097972A1 PHASE SHIFT MASK AND METHOD OF MANUFACTURING DISPLAY APPARATUS USING THE SAME 有权
相位移屏蔽和使用该显示装置制造显示装置的方法

PHASE SHIFT MASK AND METHOD OF MANUFACTURING DISPLAY APPARATUS USING THE SAME
Abstract:
Provided is a method of manufacturing a display apparatus, the method including forming an amorphous silicon layer on a substrate; changing amorphous silicon in the amorphous silicon layer into crystalline silicon by irradiating the amorphous silicon with a laser beam emitted through a phase shift mask; and forming a display device, the phase shift mask including a base substrate; a barrier layer on the base substrate and including a plurality of transmissive portions which are spaced apart from each other in a first direction; and phase shift portions which alternately fill the plurality of transmissive portions in the first direction.
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