Invention Application
- Patent Title: Focus Monitoring Arrangement and Inspection Apparatus Including such an Arrangement
- Patent Title (中): 包括这样一种安排的聚焦监测装置和检验装置
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Application No.: US14867594Application Date: 2015-09-28
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Publication No.: US20160097984A1Publication Date: 2016-04-07
- Inventor: Amandev SINGH , Henricus Petrus Maria PELLEMANS
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Priority: EP14187646.6 20141003
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
An inspection apparatus (300) includes a focus monitoring arrangement (500, 500′). Focusing radiation (505) comprises radiation having a first wavelength and radiation having a second wavelength. Reference radiation and focusing radiation at each wavelength are provided with at least one relative frequency shift so that the interfering radiation detected in the detection system includes a time-varying component having a characteristic frequency. A focus detection system (520) comprises one or more lock-in detectors (520b, 520c, 900). Operating the lock-in detectors with reference to both the first and second characteristic frequencies allows the arrangement to select which of the first and second focusing radiation is used to determine whether the optical system is in focus. Good quality signals can be obtained from targets of different structure.
Public/Granted literature
- US09921489B2 Focus monitoring arrangement and inspection apparatus including such an arrangement Public/Granted day:2018-03-20
Information query
IPC分类: