发明申请
- 专利标题: NANOSTRUCTURED UNITS FORMED INSIDE A SILICON MATERIAL AND THE MANUFACTURING PROCESS TO PERFORM THEM THEREIN
- 专利标题(中): 在硅材料中形成的纳米结构单元及其制造工艺
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申请号: US14890603申请日: 2014-05-13
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公开(公告)号: US20160099368A1公开(公告)日: 2016-04-07
- 发明人: ZBIGNIEW KUZNICKI
- 申请人: SEGTON ADVANCED TECHNOLOGY SAS
- 国际申请: PCT/IB2014/001973 WO 20140513
- 主分类号: H01L31/065
- IPC分类号: H01L31/065 ; H01L31/0368 ; H01L31/0376 ; H01L31/20 ; H01L31/18
摘要:
The invention bears on elementary nanoscale units nanostructured-formed inside a silicon material and the manufacturing process to implement them. Each elementary nanoscale unit is created by means of a limited displacement of two Si atoms outside a crystal elementary unit. A localized nanoscale transformation of the crystalline matter gets an unusual functionality by focusing in it a specific physical effect as is a highly useful additional set of electron energy levels that is optimized for the solar spectrum conversion to electricity. An adjusted energy set allows a low-energy secondary electron generation in a semiconductor, preferentially silicon, material for use especially in very-high efficiency all-silicon light-to-electricity converters. The manufacturing process to create such transformations in a semiconductor material bases on a local energy deposition like ion implantation or electron beam irradiation and suitable thermal treatment and is industrially easily available.
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