Invention Application
- Patent Title: FLUID HANDLING DEVICE AND METHOD OF HANDLING FLUID
- Patent Title (中): 流体处理装置及其处理方法
-
Application No.: US14990826Application Date: 2016-01-08
-
Publication No.: US20160114324A1Publication Date: 2016-04-28
- Inventor: Koichi ONO
- Applicant: Enplas Corporation
- Priority: JP2011-161914 20110725; JP2012-160407 20120719
- Main IPC: B01L3/00
- IPC: B01L3/00

Abstract:
A fluid handling device has a first substrate, a second substrate, and a resin film disposed between the first substrate and the second substrate. The first substrate includes a first channel, a valve body facing area having a substantially circular segment-shaped opening, a second channel, and a partition wall formed between the valve body facing area and an end on one side of the second channel. The second substrate includes a pressure chamber. The resin film includes a substantially spherical cap-shaped diaphragm portion. A radius of an outer edge of the diaphragm portion is smaller than a radius of a circular arc of the valve body facing area. The diaphragm portion is so arranged as to straddle the valve body facing area and the end on one side of the second channel.
Public/Granted literature
- US09463459B2 Fluid handling device and method of handling fluid Public/Granted day:2016-10-11
Information query
IPC分类: