Invention Application
US20160122227A1 PROCESS FOR OBTAINING A SUBSTRATE 审中-公开
获得基材的方法

  • Patent Title: PROCESS FOR OBTAINING A SUBSTRATE
  • Patent Title (中): 获得基材的方法
  • Application No.: US14893390
    Application Date: 2014-05-21
  • Publication No.: US20160122227A1
    Publication Date: 2016-05-05
  • Inventor: Emmanuel MIMOUNBrice DUBOST
  • Applicant: SAINT-GOBAIN GLASS FRANCE
  • Priority: FR1354729 20130524
  • International Application: PCT/FR2014/051191 WO 20140521
  • Main IPC: C03B27/012
  • IPC: C03B27/012
PROCESS FOR OBTAINING A SUBSTRATE
Abstract:
In a process for obtaining a transparent substrate including a refractive index modulation pattern, a transparent substrate is irradiated with a laser radiation focused on the substrate in the form of at least one laser line, where the substrate at least partially absorbs the laser radiation, a relative movement is generated between the substrate and the laser line focused on the substrate, in a direction (X) transverse to the longitudinal direction (Y) of the laser line, and, in the course of this relative movement, the power of the laser line is temporally modulated as a function of the speed of the relative movement and as a function of the dimensions of the pattern in the direction (X) of the relative movement.
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