发明申请
- 专利标题: APPARATUS FOR PRODUCING SiC SINGLE CRYSTALS AND METHOD OF PRODUCING SiC SINGLE CRYSTALS USING SAID PRODUCTION APPARATUS
- 专利标题(中): 用于生产SiC单晶的装置和使用生产装置制造SiC单晶的方法
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申请号: US14889463申请日: 2014-05-19
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公开(公告)号: US20160122900A1公开(公告)日: 2016-05-05
- 发明人: Kazuhito KAMEI , Kazuhiko KUSUNOKI , Motohisa KADO , Hironori DAIKOKU , Hidemitsu SAKAMOTO
- 申请人: NIPPON STEEL & SUMITOMO METAL CORPORATION , TOYOTA JIDOSHA KABUSHIKI KAISHA
- 申请人地址: JP Tokyo JP Aichi
- 专利权人: NIPPON STEEL & SUMITOMO METAL CORPORATION,TOYOTA JIDOSHA KABUSHIKI KAISHA
- 当前专利权人: NIPPON STEEL & SUMITOMO METAL CORPORATION,TOYOTA JIDOSHA KABUSHIKI KAISHA
- 当前专利权人地址: JP Tokyo JP Aichi
- 优先权: JP2013-115439 20130531
- 国际申请: PCT/JP2014/063192 WO 20140519
- 主分类号: C30B17/00
- IPC分类号: C30B17/00 ; C30B29/36
摘要:
An apparatus for producing SiC single crystals where the quality of the SiC single crystals is improved, and a production method using such an apparatus are provided. The apparatus for producing SiC single crystals according to an embodiment of the present invention is employed to produce an SiC single crystal by the solution growth method. The production apparatus includes a crucible and a support shaft. The crucible accommodates an Si—C solution. The support shaft supports the crucible. The support shaft includes a heat removing portion for removing heat from a bottom portion of the crucible. The heat removing portion includes one of (a) a contact portion having a thermal conductivity not less than that of the bottom portion and contacting at least a portion of the bottom portion and (b) a space adjacent to at least a portion of the contact portion or the bottom portion.
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