Invention Application
- Patent Title: LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS
- Patent Title (中): 平面设备和操作设备的方法
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Application No.: US14928891Application Date: 2015-10-30
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Publication No.: US20160124319A1Publication Date: 2016-05-05
- Inventor: Jeroen Peter Johannes Bruijstens , Richard Joseph Bruls , Hans Jansen , Siebe Landheer , Laurentius Catrinus Jorritsma , Arnout Johannes Meester , Bauke Jansen , Ivo Adam Johannes Thomas , Marcio Alexandre Cano Miranda , Maurice Martinus Johannes Van Der Lee , Gheorghe Tanasa , Lambertus Dominicus Noordam
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.
Public/Granted literature
- US10151984B2 Lithographic apparatus and a method of operating the apparatus Public/Granted day:2018-12-11
Information query
IPC分类:
