Invention Application
US20160126067A1 PLASMA PROCESSING APPARATUS 有权
等离子体加工设备

  • Patent Title: PLASMA PROCESSING APPARATUS
  • Patent Title (中): 等离子体加工设备
  • Application No.: US14785471
    Application Date: 2014-05-14
  • Publication No.: US20160126067A1
    Publication Date: 2016-05-05
  • Inventor: Naohiko OKUNISHI
  • Applicant: TOKYO ELECTRON LIMITED
  • Priority: JP2013-106895 20130521
  • International Application: PCT/JP2014/002549 WO 20140514
  • Main IPC: H01J37/32
  • IPC: H01J37/32 C23C16/44 C23C16/50
PLASMA PROCESSING APPARATUS
Abstract:
A resonance frequency is adjusted or optimized by shifting the resonance frequency without reducing an impedance function or a withstand voltage characteristic against a high frequency noise, when blocking, by using a multiple parallel resonance characteristic of a distributed constant line, the high frequency noise introduced into a line such as a power feed line or a signal line from an electrical member other than a high frequency electrode within a processing vessel. Regarding winding pitches, each of the solenoid coils 104(1) and 104(2) is divided to multiple sections K1, K2, . . . in a coil axis direction, and, a winding pitch pi in each section Ki (i=1, 2, . . . ) is set independently. Comb teeth M inserted into winding gaps of both solenoid coils 104(1) and 104(2) are formed on inner surfaces of multiple rod-shaped comb-teeth member 114 provided adjacent to the solenoid coils 104(1) and 104(2).
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