Invention Application
- Patent Title: GRAPHENE LAYER, METHOD OF FORMING THE SAME, DEVICE INCLUDING GRAPHENE LAYER AND METHOD OF MANUFACTURING THE DEVICE
- Patent Title (中): 石墨层,其形成方法,包括石墨层的装置和制造装置的方法
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Application No.: US14928026Application Date: 2015-10-30
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Publication No.: US20160126317A1Publication Date: 2016-05-05
- Inventor: Hyowon KIM , Jaeho LEE
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Priority: KR10-2014-0150628 20141031
- Main IPC: H01L29/16
- IPC: H01L29/16 ; H01L21/02

Abstract:
A graphene layer, a method of forming the graphene layer, a device including the graphene layer, and a method of manufacturing the device are provided. The method of forming the graphene layer may include forming a first graphene at a first temperature using a first source gas and forming a second graphene at a second temperature using a second source gas. One of the first and second graphenes may be a P-type graphene, and the other one of the first and second graphenes may be an N-type graphene. The first graphene and the second graphene together form a P—N junction.
Public/Granted literature
Information query
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