Invention Application
US20160128171A1 APPARATUS AND METHODS FOR OPTICS PROTECTION FROM DEBRIS IN PLASMA-BASED LIGHT SOURCE
审中-公开
用于基于等离子体光源的DEBRIS的光学保护的装置和方法
- Patent Title: APPARATUS AND METHODS FOR OPTICS PROTECTION FROM DEBRIS IN PLASMA-BASED LIGHT SOURCE
- Patent Title (中): 用于基于等离子体光源的DEBRIS的光学保护的装置和方法
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Application No.: US14739305Application Date: 2015-06-15
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Publication No.: US20160128171A1Publication Date: 2016-05-05
- Inventor: Alexey Kuritsyn , Ye Liu , Oleg Khodykin , Michael P. Kanouff
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Main IPC: H05G2/00
- IPC: H05G2/00

Abstract:
Disclosed are methods and apparatus for generating an illumination beam. In one embodiment, the apparatus includes a vacuum chamber configured to hold a target material, an optical element positioned within the vacuum chamber or within a wall of such vacuum chamber, and an illumination source system for generating at least one excitation source that is focused on the target in the vacuum chamber for generating a plasma in the vacuum chamber so as to produce illumination radiation. The apparatus further includes a debris protection system for flowing gas out of a plurality of nozzles and away from the optical element at a velocity towards the plasma so as to prevent debris from reaching such optical element.
Public/Granted literature
- US10101664B2 Apparatus and methods for optics protection from debris in plasma-based light source Public/Granted day:2018-10-16
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