Invention Application
- Patent Title: Intervertebral Implant with Fixation Geometry
- Patent Title (中): 椎间植入物与固定几何
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Application No.: US14997014Application Date: 2016-01-15
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Publication No.: US20160128845A1Publication Date: 2016-05-12
- Inventor: Dominique Messerli , Ryan T. Walsh , Brandon L. Randall , David E. Evans , Jacqueline Myer , David Koch , Markus Hunziker
- Applicant: DePuy Synthes Products, Inc.
- Main IPC: A61F2/44
- IPC: A61F2/44

Abstract:
An intervertebral spacer implant (80) is provided with a retention mechanism (86) to help alleviate expulsion and movement of the implant when placed in the spine while providing an implant that is easier to insert in the spine. In one embodiment the retention mechanism comprises a keel on at least one of the inferior or superior faces of the spacer implant preferably extending in an anterior-posterior direction. In another embodiment the implant comprises a spacer (84) and a plate (82), the plate comprising a supplemental or alternative retention mechanism. In one embodiment the retention mechanism comprises one or more holes (88) in the anterior end of the plate. In yet another embodiment, the retention mechanism comprises one or more blades that are in a first position when inserted and are preferably rotated to a second position that engages the superior and inferior vertebrae.
Public/Granted literature
- US10512548B2 Intervertebral implant with fixation geometry Public/Granted day:2019-12-24
Information query
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