Invention Application
US20160131472A1 OPTICAL MEASUREMENT SYSTEM AND METHOD FOR MEASURING CRITICAL DIMENSION OF NANOSTRUCTURE
有权
用于测量纳米结构关键尺寸的光学测量系统和方法
- Patent Title: OPTICAL MEASUREMENT SYSTEM AND METHOD FOR MEASURING CRITICAL DIMENSION OF NANOSTRUCTURE
- Patent Title (中): 用于测量纳米结构关键尺寸的光学测量系统和方法
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Application No.: US14850425Application Date: 2015-09-10
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Publication No.: US20160131472A1Publication Date: 2016-05-12
- Inventor: Alexey SHCHEKIN , Maksim RIABKO , Sergey KOPTYAEV , Anton MEDVEDEV
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Priority: RU2014145185 20141110; KR10-2015-0088724 20150622
- Main IPC: G01B11/00
- IPC: G01B11/00 ; G01B9/02

Abstract:
Provided is an optical measurement system. The optical measurement system includes: an optical module which includes an optical system and which is configured to illuminate a sample and register a defocused image of a nanostructured surface of the sample, an optical system parameter control module configured to set optical parameters of the optical system, an optical transfer function (OTF) measurement module configured to measure an OTF, a defocused image calculation module configured to calculate the defocused image based on the measured OTF and the optical parameters, and a critical dimension (CD) evaluation module configured to compare the registered defocused image with the calculated defocused image of the nanostructured surface of the sample and to output a CD value of the nanostructured surface.
Public/Granted literature
- US09995648B2 Optical measurement system and method for measuring critical dimension of nanostructure Public/Granted day:2018-06-12
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