发明申请
- 专利标题： METHOD AND APPARATUS TO MODEL OBJECTS INCLUDING PARTICLES
- 专利标题（中）： 包括颗粒在内的模型对象的方法和装置
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申请号： US14940740申请日： 2015-11-13
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公开(公告)号： US20160140266A1公开(公告)日： 2016-05-19
- 发明人: Nahyup KANG , Jiyeon KIM , Hyong Euk LEE , Hwiryong JUNG
- 申请人： Samsung Electronics Co., Ltd.
- 申请人地址： KR Suwon-si
- 专利权人： SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人： SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人地址： KR Suwon-si
- 优先权： KR10-2014-0158083 20141113
- 主分类号： G06F17/50
- IPC分类号： G06F17/50
摘要：
A method and corresponding apparatus to model objects includes detecting an overlapping area between first and second objects each comprising particles. The method and corresponding apparatus also calculate, in the overlapping area, an action force between the first and the second objects. The method and corresponding apparatus model the first object and the second object based on the action force.
公开/授权文献
- US10572609B2 Method and apparatus to model objects including particles 公开/授权日：2020-02-25
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