Provided are a barrier laminate, a gas barrier film including the barrier laminate, and a device including the gas barrier film. The barrier laminate includes an inorganic layer and a first organic layer, in which the inorganic layer and the first organic layer are in direct contact with each other, the first organic layer is formed by curing a polymerizable composition containing a polymerizable compound, a polymerization initiator, and a silane coupling agent represented by the following Formula (1) (in Formula (1), R2 represents a halogen element or an alkyl group, R3 represents a hydrogen atom or an alkyl group, L represents a divalent linking group, and n represents an integer of 0 to 2), the first organic layer contains titanium oxide fine particles, and the inorganic layer is formed on a surface of the first organic layer using a chemical vapor deposition method. The barrier laminate has high barrier properties and transparency.