Invention Application
- Patent Title: SUBTHRESHOLD METAL OXIDE SEMICONDUCTOR FOR LARGE RESISTANCE
- Patent Title (中): 用于大电阻的硫化金属氧化物半导体
-
Application No.: US14642309Application Date: 2015-03-09
-
Publication No.: US20160173072A1Publication Date: 2016-06-16
- Inventor: Mazhareddin TAGHIVAND , Yashar RAJAVI , Alireza KHALILI
- Applicant: QUALCOMM Incorporated
- Main IPC: H03K5/08
- IPC: H03K5/08

Abstract:
Certain aspects of the present disclosure generally relate to generating a large electrical resistance. One example circuit generally includes a first transistor having a gate, a source connected with a first node of the circuit, and a drain connected with a second node of the circuit. The circuit may also include a voltage-limiting device connected between the gate and the source of the first transistor, wherein the device, if forward biased, is configured to limit a gate-to-source voltage of the first transistor such that the first transistor operates in a sub-threshold region. The circuit may further include a second transistor configured to bias the voltage-limiting device with a current, wherein a drain of the second transistor is connected with the gate of the first transistor, a gate of the second transistor is connected with the first node, and a source of the second transistor is connected with an electric potential.
Public/Granted literature
- US10128823B2 Subthreshold metal oxide semiconductor for large resistance Public/Granted day:2018-11-13
Information query
IPC分类: