发明申请
US20160177621A1 MASKING SYSTEMS AND METHODS 审中-公开
掩蔽系统和方法

  • 专利标题: MASKING SYSTEMS AND METHODS
  • 专利标题(中): 掩蔽系统和方法
  • 申请号: US14973348
    申请日: 2015-12-17
  • 公开(公告)号: US20160177621A1
    公开(公告)日: 2016-06-23
  • 发明人: Paul Trpkovski
  • 申请人: PDS IG Holding LLC
  • 主分类号: E06B9/00
  • IPC分类号: E06B9/00 B05D1/32
MASKING SYSTEMS AND METHODS
摘要:
Embodiments provide systems, methods, and masking workstations for masking a planar substrate with a shield. The shield is configured to facilitate the removal of a waste portion of masking material from a portion of a planar substrate. In some cases the shield is placed adjacent to a substrate and a masking material is applied to the substrate and at least a portion of the shield. A waste portion is separated from the masking material and the shield removes the waste portion. Embodiments can be useful for masking only a portion of a planar substrate, including glass panes and glass units, for example.
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