发明申请
- 专利标题: MASKING SYSTEMS AND METHODS
- 专利标题(中): 掩蔽系统和方法
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申请号: US14973348申请日: 2015-12-17
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公开(公告)号: US20160177621A1公开(公告)日: 2016-06-23
- 发明人: Paul Trpkovski
- 申请人: PDS IG Holding LLC
- 主分类号: E06B9/00
- IPC分类号: E06B9/00 ; B05D1/32
摘要:
Embodiments provide systems, methods, and masking workstations for masking a planar substrate with a shield. The shield is configured to facilitate the removal of a waste portion of masking material from a portion of a planar substrate. In some cases the shield is placed adjacent to a substrate and a masking material is applied to the substrate and at least a portion of the shield. A waste portion is separated from the masking material and the shield removes the waste portion. Embodiments can be useful for masking only a portion of a planar substrate, including glass panes and glass units, for example.
公开/授权文献
- US10246936B2 Masking systems and methods 公开/授权日:2019-04-02
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