Invention Application
- Patent Title: POLARIZING PLATE FABRICATION METHOD
- Patent Title (中): 极化板制造方法
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Application No.: US15069307Application Date: 2016-03-14
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Publication No.: US20160195655A1Publication Date: 2016-07-07
- Inventor: Hideaki KAGAWA , Kazuhiro OKI
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP2013-201540 20130927
- Main IPC: G02B5/30
- IPC: G02B5/30

Abstract:
The polarizing plate fabrication method includes the following: (1) preparing a transfer material including a temporary support and a transfer body including an optical anisotropic layer and an optical anisotropic layer; (2) peeling the temporary support and separating it from the transfer body; and (3) adhering the transfer body to a film including a polarizer, in which both the optical anisotropic layer and the optical anisotropic layer are layers formed of a polymerizable composition including a liquid crystal compound applied onto the temporary support, and the optical anisotropic layer and the optical anisotropic layer both have in-plane retardation, and a difference between slow axis directions in the optical anisotropic layer and the optical anisotropic layer is in a range of 3° to 90°. The fabrication method allows adhering of an optical anisotropic layer having a variety of optical compensation capabilities to a variety of polarizers in a minimum constitution.
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