Invention Application
- Patent Title: PLATING DEVICE
- Patent Title (中): 电镀设备
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Application No.: US14980610Application Date: 2015-12-28
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Publication No.: US20160201213A1Publication Date: 2016-07-14
- Inventor: Masanori SUZUKI , Takashi OTA
- Applicant: TDK CORPORATION
- Applicant Address: JP Tokyo
- Assignee: TDK CORPORATION
- Current Assignee: TDK CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP2015-002992 20150109
- Main IPC: C25D21/06
- IPC: C25D21/06 ; C25D17/02
Abstract:
A plating device equipped with a plating tank and an impurity removal mechanism disposed so as to remove impurities from a plating solution in the plating tank or a plating solution to be supplied to the plating tank, in which the impurity removal mechanism includes at least one of a carboxylic acid removal mechanism and an alcohol removal mechanism.
Information query
