Invention Application
- Patent Title: PHOTO-ALIGNMENT MATERIAL AND PHOTO-ALIGNMENT METHOD
- Patent Title (中): 照相材料和相片对准方法
-
Application No.: US14911097Application Date: 2014-08-06
-
Publication No.: US20160202560A1Publication Date: 2016-07-14
- Inventor: Motoi Kinoshita , Atsushi Shishido , Isa Nishiyama
- Applicant: TOKYO INSTITUTE OF TECHNOLOGY , DIC CORPORATION
- Applicant Address: JP Tokyo JP Tokyo
- Assignee: TOKYO INSTITUTE OF TECHNOLOGY,DIC CORPORATION
- Current Assignee: TOKYO INSTITUTE OF TECHNOLOGY,DIC CORPORATION
- Current Assignee Address: JP Tokyo JP Tokyo
- Priority: JP2013-168669 20130814
- International Application: PCT/JP2014/070747 WO 20140806
- Main IPC: G02F1/1337
- IPC: G02F1/1337 ; C09K19/56
Abstract:
A photo-alignment material in which an alignment film can be formed parallel to a vibration direction of light and a tilt angle of the alignment film is easily controlled and a photo-alignment method using the photo-alignment material are provided. A photo-alignment material of the present invention contains a photo-responsive substance having a threshold value of responding light intensity.
Information query
IPC分类:
