Invention Application
US20160203956A1 ETCHING SOURCE INSTALLABLE IN A STORAGE MEDIUM PROCESSING TOOL
审中-公开
在存储介质加工工具中安装的蚀刻源
- Patent Title: ETCHING SOURCE INSTALLABLE IN A STORAGE MEDIUM PROCESSING TOOL
- Patent Title (中): 在存储介质加工工具中安装的蚀刻源
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Application No.: US14916081Application Date: 2014-01-17
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Publication No.: US20160203956A1Publication Date: 2016-07-14
- Inventor: Samuel Lewis Tanaka , Thomas Larson Greenberg
- Applicant: SEAGATE TECHNOLOGY LLC
- International Application: PCT/US2014/011981 WO 20140117
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H01J37/34 ; C23C14/34
Abstract:
A plasma etching source installable into at least one of multiple compartments of a sputter deposition tool. The plasma etching source includes a first mounting plate and at least one electrode plate coupled to the first mounting plate. A gas inlet is included in the first mounting plate of the plasma etching source.
Public/Granted literature
- US10184170B2 Etching source installable in a storage medium processing tool Public/Granted day:2019-01-22
Information query
