Invention Application
US20160207066A1 DEPOSITION APPARATUS AND DEPOSITION METHOD USING THE SAME 有权
沉积装置和使用该沉积方法的沉积方法

  • Patent Title: DEPOSITION APPARATUS AND DEPOSITION METHOD USING THE SAME
  • Patent Title (中): 沉积装置和使用该沉积方法的沉积方法
  • Application No.: US14967053
    Application Date: 2015-12-11
  • Publication No.: US20160207066A1
    Publication Date: 2016-07-21
  • Inventor: Jeong Won Han
  • Applicant: Samsung Display Co., Ltd.
  • Priority: KR10-2015-0010126 20150121
  • Main IPC: B05D1/32
  • IPC: B05D1/32 B05C21/00
DEPOSITION APPARATUS AND DEPOSITION METHOD USING THE SAME
Abstract:
A deposition apparatus for manufacturing a display device is disclosed. In one aspect, the apparatus includes a substrate fixing portion configured to fix a deposition substrate to a lower portion thereof and a first mask transfer portion placed on one side of the substrate fixing portion and configured to move the deposition mask upwardly such that the deposition mask is formed spaced apart from the deposition substrate by a predetermined distance. The apparatus also includes a substrate transfer portion configured to move the deposition substrate such that the deposition substrate passes over the deposition mask. The apparatus further includes a mask spacing portion positioned on the substrate fixing portion and configured to maintain a substantially uniform distance between the deposition substrate and the deposition mask when the deposition substrate is moved and a deposition source configured to deposit a deposition material on the deposition substrate through the deposition mask.
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