Invention Application
- Patent Title: GAS CONCENTRATION MEASURING APPARATUS
- Patent Title (中): 气体浓度测量装置
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Application No.: US14914370Application Date: 2014-08-29
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Publication No.: US20160209358A1Publication Date: 2016-07-21
- Inventor: Yuusuke TOUDOU , Takehito KIMATA , Toru KATAFUCHI
- Applicant: DENSO CORPORATION
- Priority: JP2013-178980 20130830; JP2014-165752 20140818
- International Application: PCT/JP2014/072719 WO 20140829
- Main IPC: G01N27/417
- IPC: G01N27/417 ; G01N27/407 ; G01N27/419

Abstract:
A gas concentration measuring apparatus is provided which works to calculate the concentration of a given gas component with enhanced accuracy. The gas concentration measuring apparatus 1 includes, a gas sensor 10 and a calculating portion 11. The gas sensor 10 is equipped with a pump cell 3, a monitor cell 4, and a sensor cell 5. The calculating portion 11 subtracts a monitor cell current Im that is a current flowing through the monitor cell 4 from a sensor cell current Is that is a current flowing through the sensor cell 5 to calculate the concentration of the given gas component in gas g. When calculating the concentration of the given gas component, the calculating portion 11 performs a correction operation to bring a value of the monitor cell current Im close to a value of an oxygen dependent current Iso that is a component of the sensor cell current Is which arises from the concentration of oxygen.
Public/Granted literature
- US10073053B2 Gas concentration measuring apparatus Public/Granted day:2018-09-11
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