Invention Application
US20160247664A1 BIPOLAR WAFER CHARGE MONITOR SYSTEM AND ION IMPLANTATION SYSTEM COMPRISING SAME
有权
双极波浪充电监测系统和包含相同的离子植入系统
- Patent Title: BIPOLAR WAFER CHARGE MONITOR SYSTEM AND ION IMPLANTATION SYSTEM COMPRISING SAME
- Patent Title (中): 双极波浪充电监测系统和包含相同的离子植入系统
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Application No.: US14631066Application Date: 2015-02-25
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Publication No.: US20160247664A1Publication Date: 2016-08-25
- Inventor: Marvin Farley , Takao Sakase , Joseph Foley
- Applicant: Axcelis Technologies, Inc.
- Main IPC: H01J37/304
- IPC: H01J37/304 ; H01J37/317

Abstract:
A charge monitor having a Langmuir probe is provided, wherein a positive and negative charge rectifier are operably coupled to the probe and configured to pass only a positive and negative charges therethrough, respectively. A positive current integrator is operably coupled to the positive charge rectifier, wherein the positive current integrator is biased via a positive threshold voltage, and wherein the positive current integrator is configured to output a positive dosage based, at least in part, on the positive threshold voltage. A negative current integrator is operably coupled to the negative charge rectifier, wherein the negative current integrator is biased via a negative threshold voltage, and wherein the negative current integrator is configured to output a negative dosage based, at least in part, on the negative threshold voltage. A positive charge counter and a negative charge counter are configured to respectively receive the output from the positive current integrator and negative current integrator in order to provide a respective cumulative positive charge value and cumulative negative charge value associated with the respective positive charge and negative charge.
Public/Granted literature
- US09558914B2 Bipolar wafer charge monitor system and ion implantation system comprising same Public/Granted day:2017-01-31
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