发明申请
- 专利标题: PROCESS FOR ACIDIC SCRUBBING OF DINITROTOLUENE IN THE PRESENCE OF HYDROCYANIC ACID
- 专利标题(中): 氨基酸在酸性酸存在下的酸洗过程
-
申请号: US15031100申请日: 2014-10-22
-
公开(公告)号: US20160251302A1公开(公告)日: 2016-09-01
- 发明人: SAMUEL NETO , Rüdiger FRITZ , Renate HEMPEL , Holger ALLARDT , Yuan Shen DAI , Barbara BECKER , Sebastian AHRENS , Julia LESCHINSKI , Henrich HERMANN , Mirko HAENDEL , Jürgen PÖHLMANN
- 申请人: BASF SE , JOSEF MEISSNER GMBH & CO. KG
- 优先权: EP13189687.0 20131022
- 国际申请: PCT/EP2014/072633 WO 20141022
- 主分类号: C07C201/16
- IPC分类号: C07C201/16 ; C02F1/26 ; C02F1/20 ; B01D11/04 ; C02F3/00
摘要:
Process for scrubbing a crude mixture which is obtained in the nitration of toluene after separating off the nitrating acid and comprises dinitrotoluene, nitric acid, nitrogen oxides and sulfuric acid, which comprises two scrubbing steps (WS-I) and (WS-II), wherein i) in a first scrubbing step (WS-I), the crude mixture is extracted with a scrubbing acid I comprising nitric acid, nitrogen oxides and sulfuric acid in a scrub comprising at least one extraction stage, where the scrubbing acid discharged from the first extraction stage (WS-I-1) of the first scrubbing step (WS-I) has a total acid content of from 10 to 40% by weight and a content of from 80 to 350 ppm of hydrocyanic acid, giving a prescrubbed crude mixture, ii) in a second scrubbing step (WS-II), the prescrubbed crude mixture comprising dinitrotoluene is extracted with a scrubbing acid II in a scrub comprising at least one, preferably at least 2, extraction stage(s), where the scrubbing acid discharged from the first extraction stage (WS-II-1) of the second scrubbing step (WS-II) has a pH of less than or equal to 4, giving a dinitrotoluene-comprising mixture which is essentially free of nitric acid, sulfuric acid, nitrogen oxides and hydrocyanic acid and has a content of not more than 300 ppm of nitric acid and nitrogen oxides, not more than 3 ppm of sulfate and not more than 50 ppm of hydrocyanic acid.
公开/授权文献
信息查询