Invention Application
US20160264820A1 BARRIER FILMS AND QUANTUM DOT POLYMER COMPOSITE ARTICLES INCLUDING THE SAME
审中-公开
遮蔽膜和量子聚合物复合材料,包括它们
- Patent Title: BARRIER FILMS AND QUANTUM DOT POLYMER COMPOSITE ARTICLES INCLUDING THE SAME
- Patent Title (中): 遮蔽膜和量子聚合物复合材料,包括它们
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Application No.: US15042983Application Date: 2016-02-12
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Publication No.: US20160264820A1Publication Date: 2016-09-15
- Inventor: Tomoyuki KIKUCHI , EunJoo JANG , Hyun A KANG , Nayoun WON , Oul CHO
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Priority: KR10-2015-0033992 20150311
- Main IPC: C09D183/04
- IPC: C09D183/04 ; C09D181/00 ; C09K11/62

Abstract:
A barrier film comprising: a substrate; a first layer disposed on the substrate and comprising an oxidation product of polysilazane; and a second layer disposed directly on the first layer and comprising a thiol-ene polymer, wherein the polysilazane comprises a repeating unit represented by Chemical Formula 1, wherein R1 and R2 are each independently hydrogen, an aliphatic hydrocarbon group, an alicyclic hydrocarbon group, an alkylsilyl group, an alkylamino group, an alkoxy group, or an aromatic hydrocarbon group, and wherein the thiol-ene polymer is a polymerization product of a monomer combination including a first monomer having at least two thiol groups at its terminal end and a second monomer having at least two carbon-carbon unsaturated bond-containing groups at its terminal end.
Information query
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