Invention Application
US20160304815A1 METHODS AND CHEMICAL SOLUTIONS FOR CLEANING PHOTOMASKS USING QUATERNARY AMMONIUM HYDROXIDES
审中-公开
使用季铵羟基清洗光敏剂的方法和化学解决方案
- Patent Title: METHODS AND CHEMICAL SOLUTIONS FOR CLEANING PHOTOMASKS USING QUATERNARY AMMONIUM HYDROXIDES
- Patent Title (中): 使用季铵羟基清洗光敏剂的方法和化学解决方案
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Application No.: US15132480Application Date: 2016-04-19
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Publication No.: US20160304815A1Publication Date: 2016-10-20
- Inventor: Jeffrey Lowe , Kim Van Berkel , Jae-Hyuck Choi
- Applicant: Intermolecular, Inc. , Samsung Electronics Co., Ltd.
- Applicant Address: US CA San Jose KR Gyeonggi-do
- Assignee: Intermolecular, Inc.,Samsung Electronics Co., Ltd.
- Current Assignee: Intermolecular, Inc.,Samsung Electronics Co., Ltd.
- Current Assignee Address: US CA San Jose KR Gyeonggi-do
- Main IPC: C11D3/30
- IPC: C11D3/30 ; B08B3/10 ; C11D3/28 ; B08B3/08 ; G03F1/82 ; G03F1/22
Abstract:
Embodiments provided herein describe methods and chemical solutions for cleaning photomasks. A photomask is provided. The photomask is exposed to a chemical solution. The chemical solution includes a quaternary ammonium hydroxide.The quaternary ammonium hydroxide may include at least one of tetraethyl ammonium hydroxide (TEAH), tetrapropyl ammonium hydroxide (TPAH), or a combination thereof. The photomask may be an extreme ultraviolet (EUV) lithography photomask.
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