Invention Application
- Patent Title: DEFECT INSPECTION METHOD AND DEVICE USING SAME
- Patent Title (中): 缺陷检查方法和使用相同的设备
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Application No.: US15132812Application Date: 2016-04-19
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Publication No.: US20160305893A1Publication Date: 2016-10-20
- Inventor: Yukihiro SHIBATA , Hideki FUKUSHIMA , Yuta URANO , Toshifumi HONDA
- Applicant: Hitachi High-Technologies Corporation
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Priority: JP2013-048272 20130311
- Main IPC: G01N21/956
- IPC: G01N21/956 ; H04N5/225 ; G06T7/00 ; H04N5/247 ; G01N21/95 ; G01N21/47

Abstract:
A defect inspection device inspecting a sample includes a movable table on which the sample as an inspection object and a pattern chip are mounted, an illumination light irradiation unit which irradiates a surface of the sample or a surface of the pattern chip with linearly-formed illumination light, a detection optical system section where a plurality of detection optical systems are disposed at a plurality of positions above the table and which detect images of scattered light generated from the sample, and a signal processing unit which processes detected signals to detect a defect of the sample surface, and a plurality of repeating patterns for generating the scattered light according to positions of the objective lenses of the plurality of detection optical systems of the detection optical system section when the linearly-formed illumination light is irradiated by the illumination light irradiation unit are periodically formed in the pattern chip.
Public/Granted literature
- US09606071B2 Defect inspection method and device using same Public/Granted day:2017-03-28
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