An array substrate, a method for fabricating the array substrate and a display device are described. The array substrate includes: a first gate electrode metal layer; a first gate insulation layer; an active layer on the first gate insulation layer; an etching barrier layer on the active layer; a source-drain metal layer including a source electrode and a drain electrode that contact with two sides of the active layer respectively; a second gate insulation layer on the source-drain metal layer; and a second gate electrode metal layer on the second gate insulation layer. The array substrate has an optimized TFT performance and a reduced gate line resistance, and light may be blocked from irradiating on the active layer, which is beneficial to restrain IR Drop, drifting of TFT threshold voltages or generation of a light-incurred leakage current on the active layer. Performance of the display device is improved.