Invention Application
- Patent Title: METHODS FOR FORMING PATTERN USING CYCLIC PROCESSING
- Patent Title (中): 使用循环加工形成图案的方法
-
Application No.: US15084479Application Date: 2016-03-30
-
Publication No.: US20160314981A1Publication Date: 2016-10-27
- Inventor: Junho YOON , KyungYub JEON , Kyohyeok KIM , Jaehong PARK , Je-Woo HAN
- Applicant: Samsung Electronics Co., Ltd.
- Priority: KR10-2015-0059148 20150427
- Main IPC: H01L21/3065
- IPC: H01L21/3065 ; H01L21/02 ; H01L21/308
Abstract:
A method for forming a vertical pattern includes forming a tungsten layer on a lower layer and performing a cyclic process including an etch process and an oxidation process on the tungsten layer to form a vertical pattern. Performing the cyclic process includes oxidizing the tungsten layer by an oxidation process using oxygen plasma to form a tungsten oxide layer and selectively etching the tungsten oxide layer by an etch process using a chlorine-based gas.
Information query
IPC分类:
