A vertically integrated transistor device increases the effective active area of the device to improve the performance characteristics of the device. The transistor device may include a plurality of gate elements, a plurality of source-drain elements extending parallel to the plurality of gate elements and horizontally spaced therefrom; and a plurality of fin elements extending parallel to the plurality of gate elements and vertically spaced therefrom, wherein each of the plurality of fin elements is horizontally spaced a first distance from each of the other ones of the plurality of fin elements.