发明申请
- 专利标题: WIRING SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME
- 专利标题(中): 配线基板及其制造方法
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申请号: US15153884申请日: 2016-05-13
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公开(公告)号: US20160338195A1公开(公告)日: 2016-11-17
- 发明人: Kosuke IKEDA
- 申请人: IBIDEN CO. LTD.
- 申请人地址: JP Ogaki
- 专利权人: IBIDEN CO. LTD.
- 当前专利权人: IBIDEN CO. LTD.
- 当前专利权人地址: JP Ogaki
- 优先权: JP2015-099629 20150515
- 主分类号: H05K1/02
- IPC分类号: H05K1/02 ; H05K3/40 ; H05K3/46 ; H05K1/11 ; H05K1/03
摘要:
A wiring substrate includes a core substrate, and a build-up layer including conductor layers and insulating layers alternately laminated on the substrate and via conductors formed in the insulating layers, each insulating layer having a coating layer and a support layer stacked on the coating layer such that the support layer has surface on which a conductor layer is laminated and the coating layer is covering a conductor layer, each via conductor connecting two conductor layers through an insulating layer. The coating layer has a thickness greater than that of the support layer and includes inorganic filler at content rate of 65 to 85% by mass, and the support layer includes inorganic filler at different content rate such that thermal expansion coefficient of the coating layer is smaller than that of the support layer and the coefficients of the coating and support layers have difference of 30 ppm/° C. or less.
公开/授权文献
- US09775237B2 Wiring substrate and method for manufacturing the same 公开/授权日:2017-09-26
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