发明申请
- 专利标题: CLEANSING COMPOSITION CONTAINING OLIGODYNAMIC METAL AND EFFICACY ENHANCING AGENT
- 专利标题(中): 含有低分子金属和有效增强剂的清洁组合物
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申请号: US15114102申请日: 2015-01-06
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公开(公告)号: US20160362646A1公开(公告)日: 2016-12-15
- 发明人: Ajit Manohar AGARKHED , Nitish KUMAR , Divya PARUCHURI
- 申请人: CONOPCO, INC., D/B/A UNILEVER
- 申请人地址: US NJ Englewood Cliffs
- 专利权人: Conopco, Inc., d/b/a UNILEVER
- 当前专利权人: Conopco, Inc., d/b/a UNILEVER
- 当前专利权人地址: US NJ Englewood Cliffs
- 优先权: EP14152967.7 20140129
- 国际申请: PCT/EP2015/050079 WO 20150106
- 主分类号: C11D9/18
- IPC分类号: C11D9/18 ; C11D10/04 ; C11D9/30 ; C11D9/02 ; C11D9/00
摘要:
In one aspect is disclosed a cleansing composition comprising: (i) a surfactant; (ii) an oligodynamic metal or ions thereof; (iii) a chelating agent; and, a polymer having a group comprising a site having one or more lone pair of electrons wherein, said surfactant is soap. The polymer having a group comprising a site having one or more lone pair of electrons enhances the antimicrobial efficacy of the oligodynamic metal.
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