Invention Application
- Patent Title: REPLACEMENT GATE MULTIGATE TRANSISTOR FOR EMBEDDED DRAM
-
Application No.: US15160482Application Date: 2016-05-20
-
Publication No.: US20160379986A1Publication Date: 2016-12-29
- Inventor: Josephine B. Chang , Leland Chang , Michael A. Guillorn , Wilfried E. Haensch
- Applicant: GLOBALFOUNDRIES, INC.
- Main IPC: H01L27/108
- IPC: H01L27/108 ; H01L27/12

Abstract:
A memory cell, an array of memory cells, and a method for fabricating a memory cell with multigate transistors such as fully depleted finFET or nano-wire transistors in embedded DRAM. The memory cell includes a trench capacitor, a non-planar transistor, and a self-aligned silicide interconnect electrically coupling the trench capacitor to the non-planar transistor.
Information query
IPC分类: