Invention Application
- Patent Title: METHOD FOR MEASURING THE CONCENTRATION OF A PHOTORESIST IN A STRIPPING LIQUID
- Patent Title (中): 用于测量剥离液中光电离子浓度的方法
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Application No.: US14647100Application Date: 2014-05-23
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Publication No.: US20170003216A1Publication Date: 2017-01-05
- Inventor: Li Wang
- Applicant: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD
- Priority: CN201410118203.0 20140327
- International Application: PCT/CN2014/078266 WO 20140523
- Main IPC: G01N21/33
- IPC: G01N21/33 ; G01N1/38

Abstract:
The present invention discloses a method for measuring the concentration of a photoresist in a stripping liquid. In the method for measuring the concentration of a photoresist in a stripping liquid, a plurality of standard photoresist samples are prepared at first, then the spectrum of the standard photoresist samples and the spectrum of the test photoresist sample are collected, and the nth derivative of the spectrum of the standard photoresist samples and the spectrum of the test photoresist sample are taken, wherein n is an integer equal to or greater than 1, a standard curve based on the nth derivative curves and calculating the concentration of the test photoresist sample is established, the concentration of a photoresist in a stripping liquid can be measured accurately according to the standard curve.
Public/Granted literature
- US09797828B2 Method for measuring the concentration of a photoresist in a stripping liquid Public/Granted day:2017-10-24
Information query
IPC分类: