Invention Application
- Patent Title: ESD PROTECTION STRUCTURE
- Patent Title (中): ESD保护结构
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Application No.: US14953711Application Date: 2015-11-30
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Publication No.: US20170005081A1Publication Date: 2017-01-05
- Inventor: Jean Philippe LAINE , Patrice BESSE
- Applicant: Freescale Semiconductor, Inc.
- Assignee: Freescale Semiconductor, Inc.
- Current Assignee: Freescale Semiconductor, Inc.
- Priority: IBPCT/IB2015/001563 20150630
- Main IPC: H01L27/02
- IPC: H01L27/02 ; H01L29/74 ; H01L29/06 ; H01L29/66

Abstract:
An ESD protection structure comprising a thyristor structure. The thyristor structure is formed from a first P-doped section comprising a first P-doped well formed within a first region of a P-doped epitaxial layer, a first N-doped section comprising a deep N-well structure, a second P-doped section comprising a second P-doped well formed within a second region of the epitaxial layer, and a second N-doped section comprising an N-doped contact region formed within a surface of the second P-doped well. The ESD protection structure further comprises a P-doped region formed on an upper surface of the deep N-well structure and forming a part of the second P-doped section of the thyristor structure.
Public/Granted literature
- US09893050B2 ESD protection structure Public/Granted day:2018-02-13
Information query
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