Invention Application
- Patent Title: PULSED REMOTE PLASMA METHOD AND SYSTEM
- Patent Title (中): 脉冲远程等离子体方法和系统
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Application No.: US15273488Application Date: 2016-09-22
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Publication No.: US20170011889A1Publication Date: 2017-01-12
- Inventor: Jereld Lee Winkler
- Applicant: ASM IP Holding B.V.
- Main IPC: H01J37/32
- IPC: H01J37/32 ; C23C16/455 ; B08B7/00 ; C23C16/50
Abstract:
A system and method for providing pulsed excited species from a remote plasma unit to a reaction chamber are disclosed. The system includes a pressure control device to control a pressure at the remote plasma unit as reactive species from the remote plasma unit are pulsed to the reaction chamber.
Public/Granted literature
- US10340125B2 Pulsed remote plasma method and system Public/Granted day:2019-07-02
Information query
